物理化学学报 >> 1990, Vol. 6 >> Issue (04): 474-479.doi: 10.3866/PKU.WHXB19900416

研究论文 上一篇    下一篇

TiO2在Al2O3表面上分散状态的AEM研究

魏昭彬; 辛勤; Sham, E.L.; Grange, P.; Delmon, B.   

  1. 中国科学院大连化学物理研究所；比利时新鲁汶天主教大学
  • 收稿日期:1989-07-18 修回日期:1989-12-14 发布日期:1990-08-15
  • 通讯作者: 魏昭彬

Studies on TiO2 Distribution over Al2O3 by AEM

Wei Zhao-Bin; Xin Qin; Sham, E.L.; Grange, P.; Delmon, B.   

  1. Dalian Institute of Chemical Physics, Academia Sinica; University Catholique de Louvain, Belgium
  • Received:1989-07-18 Revised:1989-12-14 Published:1990-08-15
  • Contact: Wei Zhao-Bin

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摘要： 本文运用AEM方法考察了制备技术对TiO_2在Al_2O_3表面分散状态的影响. 发现嫁接法可使TiO_2非常均匀地分散在Al_2O_3表面上, 浸渍法也能得到较为均匀的TiO_2分布, 而沉淀法所得到的TiO_2分散度较差. TiO_3只聚集在Al_20_3表面上的局部区域。

Abstract: TiO_2-Al_2O_3 binary oxides were prepared by precipitation from TiCl_4 solution with aqueous ammonia; impregnation, using evaporation from titanium isoproxide in iso-propanol; and grafting, using reaction of TiCl_4 vapour with OH~- group on Al_2O_3 surface.
AEM was used to examine the morphology of TiO_2 on Al_2O_3. The results show that relative homogeneous distribution of TiO_2 on Al_2O_3 could be formed for im-pregnated samples when TiO_2 loading was not beyond one monolayer. A quite homo-geneous coverage of TiO_2 was obtained for grafting samples through anchoring of TiCl_4 molecule on OH~- group of Al_2O_3 surface. As for precipitated samples the distribution of TiO_2 was rather poor. TiO_2 covered only a part of Al_2O_3 surface.