物理化学学报 >> 1990, Vol. 6 >> Issue (06): 660-665.doi: 10.3866/PKU.WHXB19900606

研究论文 上一篇    下一篇

O(3P)原子和硅烷化学反应动力学研究

陈从香; 高义德; 朱梦霞; 孔繁敖; S. Koda   

  1. 中国科学技术大学近代化学系 合肥; 日本东京大学工学部反应化学科
  • 收稿日期:1989-05-09 修回日期:1989-11-30 发布日期:1990-12-15
  • 通讯作者: 陈从香

THE KINETIC STUDY OF REACTION O(3P) AND SILANE

Chen Cong-Xiang; Gao Yi-De; Zhu Meng-Xia; Kong Fan-Ao; Koda S.   

  1. Department of Modern Chemistry; University of Science and Technology Department of Reaction Chemistry; Faculty of Engineering; The University of Tokyo; Tokyo; Japan
  • Received:1989-05-09 Revised:1989-11-30 Published:1990-12-15

摘要: 本文报道了用流动放电-化学发光技术测定O(~3P)和硅烷化学反应速率常数.在293—413K范围内, 结果为
k=(1.05±0.36)×10~(-10)exp[(-3.06±0.10) kcal·mol~(-1) /RT] cm~3·molecule~(-1)·s~(-1)
并用过渡态理论将上述实验结果外推到200—2000 K范围内. 计算结果以三参数公式表示为:
k=7.67×10~(-19) T~(2.59) exp(-720 cal·mol~(-1)/RT) cm~3·molecule~(-1)·s~(-1).

Abstract: The measurement of rate constant of reaction O~3(P) + SiH_4 with discharge flow-chemiluminescence technique is presented. The Arrhenius form of the rate constant over temperature range 293--413 K is
k=(1.05±0.36)×10~(-10)exp[(-3.06±0.10)kcal·mol~(-1)/RT]cm~3·molecule~(-1)·s~(-1)
Using transition-state theory, the result was extrapolated to temperature range of 200--2000 K. The calculated dependence of the rate constant on temperature with three parameters is
k=7.67×10~(-19)T~(2.59)exp (-720 cal·mol~(-1)/RT)cm~3·molecule~(-1)·s~(-1).