物理化学学报 >> 1993, Vol. 9 >> Issue (01): 99-102.doi: 10.3866/PKU.WHXB19930117

研究简报 上一篇    下一篇

氯离子对铜或黄铜表面膜半导体性质的影响

潘传智; 杨迈之; 蔡生民; 周国定   

  1. 浙江工学院化工系;北京大学化学系,北京 100871;上海电力学院化工系
  • 收稿日期:1991-08-06 修回日期:1991-12-24 发布日期:1993-02-15
  • 通讯作者: 杨迈之

Influence of Chloride Ions Upon Semiconductor Properties of Oxide Films on Copper and Brass

Pan Chuan-Zhi; Yang Mai-Zhi; Cai Sheng-Min; Zhou Guo-Ding   

  1. Department of Chemical Engineering, Zhejiang Institute of Technology; Chemistry Department, Peking University, Beijing 100871; Shanghai Institute of Electric Power
  • Received:1991-08-06 Revised:1991-12-24 Published:1993-02-15
  • Contact: Yang Mai-Zhi

关键词: 铜电极, 黄铜电极, 光电流, 腐蚀, 氯离子影响

Abstract: The photocurrent-potential relationship for copper and brass electrodes under periodic illumination was obtained during slow (6 mV·s~(-1)) cyclic potential scans with lock-in amplifier in 0.1 molo·L~(-1) Na_2B_4O_7 contianing variable concentration of NaCl. Only cathodic photocurrent was exhibited on photocurrent vs. potential curves in absence of or in the presence of low concentrations of chloride ion in the solution. The minimum concentration of NaCl at which an anodic photocurrent peak appeared is 7.5×10~(-4) g·g~(-1) for copper and 3.8×10~(-3) g·g~(-1) for brass. With the continuous increase of NaCl concentraton the peak area of anodic photocurrent increases and that of cathodic decreases. The appearance of anodic photocurrent peak and its magnitude on photocurrent vs. potential curve may be served as a criterion for the characterization of the corrosion extent of copper material by Cl~-.

Key words: Copper, Brass, Photocurrent, Corrosion, Influence of Cl-