物理化学学报 >> 1998, Vol. 14 >> Issue (01): 27-32.doi: 10.3866/PKU.WHXB19980106

研究论文 上一篇    下一篇

In3+与Ga3+对纯铝在KOH溶液中电化学行为的影响

许刚, 曹楚南, 林海潮, 张鉴清   

  1. 金属腐蚀与防护国家重点实验室，中国科学院金属腐蚀与防护研究所，沈阳 110015|浙江大学化学系，杭州 310027
  • 收稿日期:1997-04-14 修回日期:1997-06-09 发布日期:1998-01-15
  • 通讯作者: 许刚

Influences of In3+ and Ga3+ on the Electrochemical Behaviour of Al in KOH Solution

Xu Gang, Cao Chu-Nan, Lin Hai-Chao, Zhang Jian-Qing   

  1. State Key Laboratory for Corrosion Protection,Institute of Corrosion Protection of Metals,Academia Sinica,Shenyang 110015|Department of Chemistry,Zhejiang University,Hangzhou 310027
  • Received:1997-04-14 Revised:1997-06-09 Published:1998-01-15
  • Contact: Xu Gang

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摘要：

通过极化曲线、交流阻抗的方法研究了纯铝在1mol•L－1KOH溶液中的电化学行为，分析了铝在碱性介质中活性溶解时的特殊动力学现象．通过溶液中添加金属离子In3十和Ga3＋，研究了高析氢过电位金属离子对纯铝在KOH溶液中阳极溶解过程的影响机制，并结合扫描电镜照片（SEM）证明了In3十和Ga3十对铝电极溶解的影响过程．

关键词: 极化曲线, 交流阻抗, In3+, Ga3+, 铝溶液, SEM

Abstract:

 Electrochemical Behaviors of Al in 1 mol•L-1 KOH solution without and with the addition of In3+or Ga3+ were investigated with potentiodynamic polarization and EIS techniques. Corrosion rates were measured by volumes of hydrogen evolved. The results show that though indium and gallium are the metals with high H2-evolution voltage, addition of In3+retards both anodic and cathodic reaction of the corrosion of Al in KOH solution and thus inhibits the corrosion, while Ga3+ accelerates the anodic dissolution process as well as the corrosion of Al in the solution. SEM verified the above results.

Key words: Potentiodynamic polarization, EIS, High H2-evolution voltage, In3+, Ga3+, Al dessolution, SEM