物理化学学报 >> 1998, Vol. 14 >> Issue (08): 715-718.doi: 10.3866/PKU.WHXB19980809

研究论文 上一篇    下一篇

低能离子注入固态甲酸钠的质能沉积效应

王相勤, 姚建铭, 黄卫东, 余增亮   

  1. 中国科学院等离子体物理研究所,合肥 230031
  • 收稿日期:1997-11-11 修回日期:1998-01-26 发布日期:1998-08-15
  • 通讯作者: 王相勤

Effects of Mass Energy Deposition of Low Energy lons lmplantation in Solid Sodium Formate

Wang Xiang-Qin, Yao Jian-Ming, Huang Wei-Dong, Yu Zeng-Liang   

  1. Institute of Plasmal Physics,Chinese Academy of Sciences,Hefei 230031
  • Received:1997-11-11 Revised:1998-01-26 Published:1998-08-15
  • Contact: Wang Xiang-Qin

摘要:

以N+、H+、Ar+三种离子分别辐照固态甲酸钠样品,经电子顺磁共振(EPR),红外光谱(IR)的检测. 结果发现,三种低能离子辐照后的甲酸钠样品中产生了COO-自由基和亚甲基(-CH_2).同时,结合茚三酮反应,证明了辐照后的甲酸钠样品中还含有新的基团──氨基(NH_2),并给出了氨基的产生量与注入离子的剂量和能量的相关曲线.

关键词: 离子注入, 甲酸钠, 质能沉积效应

Abstract:

Solid HCOONa sample was implanted by ions such as N+、H+、Ar+、with the same energy. The induced damage was detected by EPR and infrared (IR) spectra. It showed that the-CH2- group and COO- radical ion could be produced in implanted HCOONa sample with N+、H+、Ar、ions. By using the analysis of the highly sensitive ninhydrin reaction. It was proved that NH2 group could be produced by N+ ion beam.

Key words: Ion implantation, HCOONa, Effects of mass energy deposition