物理化学学报 >> 2000, Vol. 16 >> Issue (10): 892-898.doi: 10.3866/PKU.WHXB20001006

研究论文 上一篇    下一篇

等离子体聚合成膜中的活性粒子模拟分析

张昱, 金心宇, 陈抗生   

  1. 浙江大学信息与电子工程学院,杭州 310027
  • 收稿日期:2000-01-13 修回日期:2000-04-17 发布日期:2000-10-15
  • 通讯作者: 金心宇 E-mail:jinxy@isee.zju.edu.cn

Simulation Analysis of Active Particles in Plasma Polymerization Film Deposition

Zhang Yu, Jin Xin-Yu, Chen Kang-Sheng   

  1. Department of Information and Electronic Engineering,Hangzhou 310027
  • Received:2000-01-13 Revised:2000-04-17 Published:2000-10-15
  • Contact: Jin Xin-Yu E-mail:jinxy@isee.zju.edu.cn

摘要:

针对等离子体聚合成膜实验中的活性粒子的能量及空间分布问题 ,运用电磁场理论和 Monte Carlo方法模拟分析氢、氧、氮直流辉光放电等离子体中的活性粒子的运动 ,得出其能量分布图和空间密度分布图 ,并与离子活性能量范围相比较 ,从而得出结论 :在氢、氧等离子体中有足够多的活性离子可以参与和单体分子的物理化学反应 ,成膜较快;在氮等离子体中 ,达到活性粒子能量范围的离子相当少 ,成膜较慢 .

关键词: 粒子能量, Monte Carlo模拟, 氢、氧、氮等离子体聚合

Abstract:

The active particles movements in hydrogen, oxygen and nitrogen DC glow discharge plasma have been simulated and analyzed by applying the electromagnetic theories and Monte Carlo simulation techniques. The energy and spatial density distribution graphs have been obtained. By comparison with the active energy range of ions, the results showed that in hydrogen and oxygen plasma there are sufficient active ions to participate in the physical and chemical reactions with the monomer molecules, which resulted in high deposition speed; in nitrogen plasma there are very few ions with sufficient active energy, which resulted in low deposition speed.

Key words: Particle enery, Monte Carlo simulation, Hydrogen, Oxygen, Nitrogen, Plasma polymerization