物理化学学报 >> 2001, Vol. 17 >> Issue (02): 116-118.doi: 10.3866/PKU.WHXB20010205

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交流电在Al2O3模板中沉积金属机理探讨

王银海;牟季美;蔡维理;石刚   

  1. 中国科学技术大学材料科学与工程系,合肥　230026
  • 收稿日期:2000-05-08 修回日期:2000-07-24 发布日期:2001-02-15
  • 通讯作者: 王银海 E-mail:yhwang@mars.ahu.edu.cn

Mechanism of Metal Deposited in Porous Alumina by Alternating Current

Wang Yin-Hai;Mo Ji-Mei;Cai Wei-Li;Shi Gang   

  1. Department of Materials Science and Engineering of University of Science and Technology of China ,Hefei　230026
  • Received:2000-05-08 Revised:2000-07-24 Published:2001-02-15
  • Contact: Wang Yin-Hai E-mail:yhwang@mars.ahu.edu.cn

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摘要： 以铝阳极氧化形成有序的多孔氧化铝为模板，利用交流电在模板孔洞中沉积金属Ag得到纳米Ag粒子/Al2O3组装体系，透射电镜观察证实在氧化铝模板中有金属纳米Ag粒子存在.分析了交流电能在孔洞中沉积金属的原因是由于Al/Al2O3界面的整流特性，测量了Al/Al2O3界面的I－U关系曲线.

关键词: 氧化铝模板, 整流特性, 交流电沉积

Abstract: NanoAg/Al2O3 assemblies were prepared by alternating current(AC) electrochemical deposition of Ag in the ordered pores of alumina membranes.TEM spectra show that Ag nanoparticles were deposited in porous alumina.The reason that metal was deposited in porous alumina by AC was attributed to rectifying properties of Al/Al2O3 interface.I－U curve of Al/Al2O3 interface was measured.

Key words: Alumina template, Rectifying properties, Alternating current deposition