物理化学学报 >> 2004, Vol. 20 >> Issue (05): 507-511.doi: 10.3866/PKU.WHXB20040513

研究论文 上一篇    下一篇

WOx/TiO2光催化剂的可见光催化活性机理探讨

张琦;李新军;李芳柏;常杰   

  1. 中国科学院广州能源研究所,广州 510640;香港理工大学土木与结构工程系,香港 九龙
  • 收稿日期:2003-09-17 修回日期:2004-01-03 发布日期:2004-05-15
  • 通讯作者: 张琦 E-mail:zhangqi@ms.giec.ac.cn

Investigation on Visible -light Activity of WOx/TiO2 Photocatalyst

Zhang Qi;Li Xin-Jun;Li Fang-Bai;Chang Jie   

  1. Guangzhou Institute of Energy Conversion, Chinese Academy of Sciences, Guangzhou 510640;Department of Civil and Structural Engineering, Hong Kong Polytechnic University, Kowloon, Hong Kong
  • Received:2003-09-17 Revised:2004-01-03 Published:2004-05-15
  • Contact: Zhang Qi E-mail:zhangqi@ms.giec.ac.cn

摘要: 采用磁控溅射技术在用浸渍提拉法制得的TiO2薄膜上,溅射氧化钨层,通过气相反应中光催化降解二甲苯的实验表明,WOx/TiO2薄膜具有可见光活性.通过UV-Vis吸收光谱、X射线光电子能谱(XPS)等方法对其可见光活性的机理进行探索.UV-Vis吸收光谱表明WOx,TiO2对可见光响应的范围有一定的扩展,吸收强度增加.XPS表明WOx/TiO2薄膜表面形成了明显的W杂质能级和Ti缺陷能级,这是WOx/TiO2在可见光范围有一吸收的主要原因,也是光催化剂具有可见光活性的必要条件之一,同时杂质能级的存在使半导体费米能级上移,载流子增加,光催化效率提高.

关键词: 光催化, 可见光活性, XPS, 费米能级, 二氧化钛, 磁控溅射, 氧化钨

Abstract: The TiO2 thin films from dip-coating system were magnetron sputtered on with WOx, and can be activated by visible-light in gaseous dimethyl benzene photocatalytic degradation. The mechanism of its visible-light activity was investigated by UV-Vis absorption spectra and X-ray photoemission. UV-Vis absorption spectra showed its visible-light response expanding and having strong absorption with respect to the pure TiO2 film. XPS indicated the formation of W impurity energy level and Ti defect energy level, which was the main reason for the absorption in the visible-light range and the perquisite to have visible-light activity; and made Fermi level upper moved, free carriers more and photocatalytic efficiency enhanced.

Key words: Photocatalysis, Activity under visible-light, XPS, Fermi level,  Titanium dioxide, Magnetron sputtering, Tungsten oxide