物理化学学报 >> 2005, Vol. 21 >> Issue (01): 69-73.doi: 10.3866/PKU.WHXB20050114

研究论文 上一篇    下一篇

二氧化钛薄膜的低温制备及其性能表征

鲍兴旺;张金龙;梁学海;黄家祯;张利中   

  1. 华东理工大学精细化工研究所, 分析测试中心,上海 200237
  • 收稿日期:2004-06-28 修回日期:2004-09-02 发布日期:2005-01-15
  • 通讯作者: 张金龙 E-mail:jlzhang@ecust.edu.cn

Preparation of TiO2 Thin Films at Low Temperature and Characterization of Their Properties

BAO Xing-Wang;ZHANG Jin-Long;LIANG Xue-Hai;HUANG Jia-Zhen;ZHANG Li-Zhong   

  1. Laboratory for Advanced Materials and Institute of Fine Chemicals, Center of Analysis and Testing, East China University of Science and Technology, Shanghai 200237
  • Received:2004-06-28 Revised:2004-09-02 Published:2005-01-15
  • Contact: ZHANG Jin-Long E-mail:jlzhang@ecust.edu.cn

摘要: 通过水煮法在较低温度下制备了均匀、透明的TiO2-SiO2复合薄膜,利用XRD、AFM和UV-Vis光谱等手段对薄膜的物相、表面形态结构和透明性进行了表征,分析了SiO2的添加对薄膜性质的影响.并利用紫外光照降解罗丹明B溶液评价了薄膜的光催化活性及其影响因素.实验结果表明,通过水煮法在较低温度下制备的薄膜具有较高的光催化活性,适量SiO2的添加能够提高薄膜的光催化活性.

关键词: 水煮处理, TiO2-SiO2复合薄膜, AFM低温制备, 光催化

Abstract: TiO2 and TiO2-SiO2 thin films were prepared at low-temperature with hot water treatment. Their crystal structure, surface morphology and transparency were characterized by XRD, AFM and UV-Vis spectra respectively, and the effects of addition of SiO2 in the films on their performances after treatment with hot water were analyzed. The evaluations of photocatalytic activities of thin films were carried out by degradation of rhodamine B in water solution under UV irradiation. The results showed that the thin films prepared at low temperature with hot water treatment have high reactivity for degradation of rhodamine B and the addition of SiO2 can significantly increase the photocatalytic reactivitity.

Key words: Hot water treatment, TiO2 thin films, AFM, Low temperature,  Photocatalysis