物理化学学报 >> 2007, Vol. 23 >> Issue (11): 1743-1746.doi: 10.3866/PKU.WHXB20071117

研究论文 上一篇    下一篇

Pd在p型单晶硅(100)表面自催化化学沉积

陈扬; 景粉宁; 叶为春; 王春明   

  1. 兰州大学化学化工学院, 兰州 730000
  • 收稿日期:2007-04-18 修回日期:2007-07-26 发布日期:2007-11-01
  • 通讯作者: 王春明 E-mail:wangcm@lzu.edu.cn

Autocatalytic Electroless Deposition of Palladium onto p-Silicon (100)

CHEN Yang; JING Fen-Ning; YE Wei-Chun; WANG Chun-Ming   

  1. College of Chemistry and Chemical Engineering, Lanzhou University, Lanzhou 730000, P. R. China
  • Received:2007-04-18 Revised:2007-07-26 Published:2007-11-01
  • Contact: WANG Chun-Ming E-mail:wangcm@lzu.edu.cn

摘要: 研究了Pd在氢终止的p型单晶硅(100)表面的自催化化学沉积(AED). 在室温下将刻蚀过的硅片浸入常规的HF-PdCl2-HCl溶液制备了Pd膜. 将沉积了Pd的基底作为工作电极, 用循环伏安法(CV)、原子力显微镜(AFM)和X射线光电子能谱(XPS)研究了Pd膜的阳极溶出行为和形貌. 结果表明, Pd的生长遵循Volmer-Weber (VW)生长模式, Pd膜给出了很好的支持.

关键词: 自催化化学沉积, 阳极溶出, Pd, 原子力显微镜, p型单晶硅(100)

Abstract: The autocatalytic electroless deposition (AED) of palladiumonto p-silicon (100) with hydrogen termination was studied. Pd films were prepared by immersing the hydrogen-terminated silicon wafers into conventional HF-PdCl2-HCl solution at room temperature. The anodic stripping behaviors and morphologies of the Pd deposits were studied using cyclic voltammetry (CV), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). The results showed that the Pd growth was in Volmer-Weber (VW) mode and the Pd filmhad good adhesion.

Key words: Autocatalytic electroless deposition, Anodic stripping, Palladium, Atomic force microscopy, p-Silicon (100)

MSC2000: 

  • O646