物理化学学报 >> 2011, Vol. 27 >> Issue (03): 641-646.doi: 10.3866/PKU.WHXB20110322

电化学和新能源 上一篇    下一篇

ITO导电玻璃表面直接电沉积Au的机理

汤儆1, 田晓春1, 周富庆1, 刘跃强1, 林建航2   

  1. 1. 福州大学化学化工学院, 食品安全分析与检测教育部重点实验室, 福州 350108;
    2. 福州大学测试中心, 福州 350002
  • 收稿日期:2010-10-21 修回日期:2010-12-07 发布日期:2011-03-03
  • 通讯作者: 汤儆 E-mail:jingtang@fzu.edu.cn
  • 基金资助:

    国家自然科学基金(20873112)和国家光电子晶体材料工程技术研究中心开放课题(2005DC105003)资助项目

Mechanism of Au Electrodeposition onto Indium Tin Oxide

TANG Jing1, TIAN Xiao-Chun1, ZHOU Fu-Qing1, LIU Yue-Qiang1, LIN Jian-Hang2   

  1. 1. Key Laboratory of Analysis and Detection Technology for Food Safety, Ministry of Education, College of Chemistry and Chemical Engineering, Fuzhou University, Fuzhou 350108, P. R. China;
    2. Instrumental Measurement and Analysis Center, Fuzhou University, Fuzhou 350002, P. R. China
  • Received:2010-10-21 Revised:2010-12-07 Published:2011-03-03
  • Contact: TANG Jing E-mail:jingtang@fzu.edu.cn
  • Supported by:

    The project was supported by the National Natural Science Foundation of China (20873112) and Fund of National Engineering Research Center for Optoelectronic Crystalline Materials, China (2005DC105003).

摘要:

用循环伏安和电位阶跃法研究Au在氧化铟锡(ITO)透明导电膜玻璃表面的电沉积过程的初期阶段. 发现在ITO表面Au的电沉积经历成核过程以及受[AuCl4]-扩散控制的晶核生长过程. 通过改变扫描速率分析循环伏安曲线的变化, 当扫描速率较快时, 发现Au在ITO表面的沉积过程经历[AuCl4]-→[AuCl2]-→Au两步进行; 当扫描速率较慢时, 受歧化反应作用影响而只表现为一步沉积[AuCl4]-→Au. 通过电位阶跃实验, 验证了Au的两步沉积过程, 并求得[AuCl4]-的扩散系数为1.3×10-5 cm2·s-1. 将成核曲线与理论曲线对照, 得出Au在ITO表面的沉积符合瞬时成核理论. 通过场发射扫描电镜(FE-SEM)对Au核形貌进行分析, 根据扫描电镜图可以得到阶跃时间和阶跃电位对电沉积Au的形貌的影响.

关键词: 氧化铟锡导电玻璃, 金纳米粒子, 电沉积, 成核机理

Abstract:

Cyclic voltammetric and chronoamperometric methods were used to study the initial stage of Au electrodeposition on an indium tin oxide (ITO) surface. The nucleation process was controlled by the diffusion of [AuCl4]-. The cyclic voltammetry curves showed that the electrochemical reduction included two steps which were [AuCl4]-→ [AuCl2]-, and [AuCl2]- → Au. Only one reduction peak was observed when the scan rate was comparatively slow and this peak separated into two peaks when the scan rate was increased. This phenomenon resulted from the disproportionation of [AuCl2]- during the electrodeposition process. Chronoamperometry also proved the two step reaction mechanism and the diffusion coefficient of [AuCl4]- was calculated to be 1.3×10-5 cm2·s-1. From the theoretical nucleation curves, an instantaneous three-dimensional nucleation mechanism was proposed for the nucleation of gold on ITO. Au electrodeposits were observed by field emission scanning electron microscopy (FE-SEM). SEM images of the electrodeposits showed that the morphology of the gold deposits was affected by the electrochemical deposition potential and time.

Key words: Indium Tin Oxide, Au nano particle, Electrodeposition, Nucleation mechanism

MSC2000: 

  • O646