物理化学学报 >> 2011, Vol. 27 >> Issue (12): 2915-2919.doi: 10.3866/PKU.WHXB20112915

材料物理化学 上一篇    下一篇

感应熔炼高锰硅的结构和形貌特性

周爱军1,2, 崔恒冠1, 李晶泽1, 赵新兵2   

  1. 1. 电子科技大学电子薄膜与集成器件国家重点实验室, 成都 610054;
    2. 浙江大学硅材料国家重点实验室, 杭州 310027
  • 收稿日期:2011-07-01 修回日期:2011-09-06 发布日期:2011-11-25
  • 通讯作者: 周爱军 E-mail:zhouaj@uestc.edu.cn
  • 基金资助:

    国家自然科学基金(51102039), 中央高校基本科研业务费(ZYGX2010J033)和中国博士后科学基金(20100481375, 201104640)资助项目

Structure and Morphology of Induction-Melted Higher Manganese Silicide

ZHOU Ai-Jun1,2, CUI Heng-Guan1, LI Jing-Ze1, ZHAO Xin-Bing2   

  1. 1. State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China,Chengdu 610054, P. R. China;
    2. State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, P. R. China
  • Received:2011-07-01 Revised:2011-09-06 Published:2011-11-25
  • Contact: ZHOU Ai-Jun E-mail:zhouaj@uestc.edu.cn
  • Supported by:

    The project was supported by the National Natural Science Foundation of China (51102039), Fundamental Research Funds for the Central Universities, China (ZYGX2010J033), and China Postdoctoral Science Foundation (20100481375, 201104640).

摘要: 采用场发射扫描电镜(FESEM)和X射线能谱仪(EDXS)对感应熔炼高锰硅(HMS)中的第二相条纹的形貌和成份进行了研究, 发现第二相条纹平行贯穿整个高锰硅晶粒, 其条纹宽度约30 nm, 间距在5-30 μm内, 成份为MnSi. 通过高分辨透射电镜(HRTEM)观察到MnSi条纹为短程有序而长程无序的非晶形态. 采用选区电子衍射(SAED)确定了高锰硅的晶体结构, 结果表明所获得的高锰硅为单一的Mn4Si7相, 未观察到高锰硅其它的非公度结构. 透射电镜(TEM)结果表明, 熔炼的高锰硅经过球磨和热压后产生了大量缺陷和应力畴, 与热压之前的熔锭材料相比有明显差异.

关键词: 高锰硅, MnSi条纹, 非晶, 晶体结构, 缺陷

Abstract: Field emission scanning microscopy (FESEM) and energy-dispersive X-ray spectroscopy (EDXS) were used to study the morphology and composition of secondary phase precipitations in induction-melted higher manganese silicide (HMS). Striations of the secondary phase were observed in individual HMS crystals with an average interval of 5-30 μm and a thickness of ~30 nm. The chemical composition of the striations was examined and found to be MnSi, which was observed as an amorphous phase by high resolution transmission electron microscopy (HRTEM). The crystal structure of HMS was determined by selective area electron diffraction (SAED) and the results indicated a single Mn4Si7 phase in the as-prepared material and no other incommensurate HMS phases were found. After ball milling and hot pressing many defects and stress fields were observed in the HMS by transmission electron microscope (TEM), which differentiated substantially from the morphology of the as-melted HMS.

Key words: Higher manganese silicide, MnSi precipitation, Amorphous, Crystal structure, defect

MSC2000: 

  • O649