物理化学学报 >> 1987, Vol. 3 >> Issue (04): 389-394.doi: 10.3866/PKU.WHXB19870411

研究论文 上一篇    下一篇

CuCl/γ-Al2O3体系的XPS、SSIMS、ISS研究

郭沁林; 黄惠忠; 桂琳琳; 谢有畅; 唐有祺   

  1. 北京大学物理化学研究所
  • 收稿日期:1986-03-19 修回日期:1986-10-30 发布日期:1987-08-15

STUDIES OF CuCl/γ-Al2O3 BY XPS, SSIMS AND ISS

Guo Qinlin; Huang Huizhong; Gui Linlin; Xie Youchang; Tang Youqi   

  1. Institute of Physical Chemistry; Peking University
  • Received:1986-03-19 Revised:1986-10-30 Published:1987-08-15

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摘要： 用XPS, SSIMS, ISS研究了CuCl在γ-Al_2O_3上的分散状态。结果指出: CuCl在γ-Al_2O_3表面呈单层分散, 用XPS得出的I_Cu/I_Al强度比与总CuCl含量曲线的转折点同XRD外推法得到的最大单层分散量相近。Cu 2p3/2光电子结合能随样品中CuCl浓度的增加而下降, 分散后的CuCl与纯CuCl在价带谱上有明显不同。ISS研究表明, CuCl/γ-Al_2O_3上单层分散的Cu~+对He~+的散射峰比纯CuCl高11 eV, 这些结果说明CuCl与γ-Al_2O_3表面有较强的相互作用。分散后CuCl的Auger峰变宽可由γ-Al_2O_3表面的不均匀性解释。

Abstract: The XPS (X-Ray Photoelectron Spectroscopy), SSIMS (Static Second Ion Mass Spectroscopy) and ISS (Ion Scattering Spectroscopy) have shown that CuCl is dis- persed on γ-Al_2O_3 surface as a monolayer. The maximum amount of dispersion of CuCl on γ-Al_2O_3 surface determined by XPS is approaching to the value determined by XRD.
The binding energy of Cu 2p3/2 obtained by XPS decreases with the amount of CuCl added to the samples. The valence band spectra of CuCl dispersed on γ-Al_2O_3 is different from that of pure CuCl. ISS of He~+ gave a scattering peak of copper of CuCl/γ-Al_2O_3 11 eV higher than that of pure CuCl. They indicate that CuCl has a quite strong interaction with the γ-Al_2O_3 surface. The dispersed CuCl gave a widening Auger peak which can be attributed to the heterogeneity of γ-Al_2O_3 surface.