物理化学学报 >> 1994, Vol. 10 >> Issue (04): 363-366.doi: 10.3866/PKU.WHXB19940415

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Ar、NO和CHBr3对电子激发态CH的淬灭

陈从香, 冉琴, 俞书勤, 马兴孝   

  1. 中国科学技术大学化学物理系，合肥 230026
  • 收稿日期:1992-09-02 修回日期:1993-01-20 发布日期:1994-04-15
  • 通讯作者: 陈从香

Collisional Quenching of Electronically Excited CH Radicals by Ar, NO and CHBr3 Molecules

Chen Cong-Xiang, Ran Qin, Yu Shu-Qin, Ma Xing-Xiao   

  1. Department of Chemistry Physics, University of Science and Technology of China, Hefei 230026
  • Received:1992-09-02 Revised:1993-01-20 Published:1994-04-15
  • Contact: Chen Cong-Xiang

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关键词: CH自由基, 猝灭, Ar, NO, CHBr3

Abstract:

The collisional quenching rate constants of CH(A, V'=0) by Ar and CHBr_3 and CH(A, B, V'=0) by NO molecule were measured by means of laser photolysis of CHBr_3 molecule at 266 nm generating CH(A, B) radicals and monitoring the time-resolved signal of ethession CH(A, B→X). The dependence of quenching rate constant of CH(A, V'=0) by CHBr_3 on rotational state of CH(A) is presented. It is found that the quenching rate decreases with increasing rotational quantum number of CH(A).

Key words: CH radical, Quenching, Ar, NO, CHBr3