物理化学学报 >> 2005, Vol. 21 >> Issue (06): 612-615.doi: 10.3866/PKU.WHXB20050607

研究论文 上一篇    下一篇

氧化锌薄膜的电化学沉积和表征

陈志钢; 唐一文; 张丽莎; 陈正华; 贾志杰   

  1. 华中师范大学纳米科技研究院，武汉 430079
  • 收稿日期:2004-10-19 修回日期:2004-12-13 发布日期:2005-06-15
  • 通讯作者: 唐一文 E-mail:ywtang@phy.ccnu.edu.cn

Electrochemical Deposition and Characterization of Zinc Oxide Thin Films

CHEN Zhi-gang; TANG Yi-wen; ZHANG Li-sha; CHEN Zheng-hua; JIA Zhi-jie   

  1. Institute of Nano-science and Technology, Central China Normal University, Wuhan 430079
  • Received:2004-10-19 Revised:2004-12-13 Published:2005-06-15
  • Contact: TANG Yi-wen E-mail:ywtang@phy.ccnu.edu.cn

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摘要： 以透明导电玻璃(TCO)为衬底，用硝酸锌水溶液作为电解液，研究了阴极还原沉积ZnO薄膜的反应机理和电化学行为. 通过改变工艺条件来控制ZnO的生长速率， 得到了粒径为10～15 nm的纳米ZnO薄膜. XRD分析显示纳米ZnO薄膜纯度高， 呈纤锌矿结构. 光学测试结果表明，在可见光区其透光度高达90%，禁带宽度为3.37 eV.

关键词: 纳米ZnO, 薄膜, 阴极电沉积, 表征

Abstract: This paper investigates reaction mechanism and electrochemical behavior of ZnO thin films deposited on transparent conducting glass from a simple aqueous zinc nitrate solution. Nanocrystalline ZnO films with grain sizes of 10～15 nm are obtained by controlling the growth rate of ZnO. XRD analysis demonstrates that the nanocrystalline ZnO thin film has phase purity and wurtzite structure. Optical characterizations show that such film has high optical transmittance (up to 90%) in the visible wavelength range and its band gap is 3.37 eV.

Key words: Nanocrystalline ZnO, Thin films, Cathodic electrodeposition, Characterization