物理化学学报 >> 2010, Vol. 26 >> Issue (10): 2625-2632.doi: 10.3866/PKU.WHXB20101002

电化学 上一篇    下一篇

柠檬酸盐体系铜电沉积及其在微机电系统中的应用

吴伟刚1, 杨防祖1,  骆明辉2, 田中群1, 周绍民1   

  1. 1. 厦门大学化学化工学院, 固体表面物理化学国家重点实验室, 福建 厦门 361005;
    2. 厦门大学物理与机电工程学院, 福建 厦门 361005
  • 收稿日期:2010-03-20 修回日期:2010-07-22 发布日期:2010-09-27
  • 通讯作者: 杨防祖 E-mail:fzyang@xmu.edu.cn
  • 基金资助:

    国家自然科学基金(20873114, 20833005)和国家重点基础研究发展规划项目(973) (2009CB930703)资助

Electrodeposition of Copper in a Citrate Bath and Its Application to a Micro-Electro-Mechanical System

WU Wei-Gang1, YANG Fang-Zu1, LUO Ming-Hui2, TIAN Zhong-Qun1, ZHOU Shao-Min1   

  1. 1. College of Chemistry and Chemical Engineering, State Key Laboratory of Physical Chemistry of Solid Surfaces, Xiamen University, Xiamen 361005, Fujian Province, P. R. China;
    2. School of Physics and Mechanical & Electrical Engineering, Xiamen University, Xiamen 361005, Fujian Province, P. R. China
  • Received:2010-03-20 Revised:2010-07-22 Published:2010-09-27
  • Contact: YANG Fang-Zu E-mail:fzyang@xmu.edu.cn
  • Supported by:

    The project was supported by the National Natural Science Foundation of China (20873114, 20833005) and National Key Basic Research Programof China (973) (2009CB930703).

摘要:

研究并讨论了在新型柠檬酸盐体系铜电沉积工艺中电镀工艺参数对镀层形貌和颗粒尺寸的影响; 利用X 射线衍射(XRD) 和X 射线光电子能谱(XPS) 表征了镀层的结构和组分存在状态; 并将柠檬酸盐体系电沉积铜应用于微机电系统(MEMS) 加工工艺. 结果表明: 在6g·L-1 Cu2+, pH=7.0-8.5, 1-2A·dm-2, 45 ℃, 搅拌条件下可得到结晶细小, 表面平整的致密铜镀层; 镀层为面心立方多晶结构的单质铜, 不含其他杂质. 利用MEMS 工艺成功制得平面电感, 其有效的最大品质因数(Q)为12.75, 达到了设计要求.

关键词: 电沉积, 柠檬酸盐, 铜, 镀层表征, 平面电感, 微机电系统

Abstract:

We investigated the effect of plating parameters on the coating morphology and grain size of copper using a novel citrate bath. The structure and deposit were characterized by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), respectively. The copper plating bath was applied to a micro-electro-mechanical system (MEMS). Results show that an even and compact copper coating was obtained for the fine grains using plating parameters of 6g·L-1 Cu2+, pH=7.0-8.5, 1-2A·dm-2, 45 ℃, and bath agitation. The deposit consists of pure copper in a fcc polycrystalline structure.A planar inductor was successfully fabricated by MEMS using this bath and its maximum quality factor was 12.75, which satisfies the design requirements.

Key words: Electrodeposition, Citrate, Copper, Deposit characterization, Planar inductor, Micro -electro -mechanical system

MSC2000: 

  • O646