物理化学学报 >> 2002, Vol. 18 >> Issue (04): 321-325.doi: 10.3866/PKU.WHXB20020407

研究论文 上一篇    下一篇

CeO2和Pd在Ni/γ-Al2O3催化剂中的助剂作用

杨咏来;徐恒泳;李文钊   

  1. 中国科学院大连化学物理研究所,大连 116023
  • 收稿日期:2001-09-16 修回日期:2001-12-03 发布日期:2002-04-15
  • 通讯作者: 杨咏来 E-mail:yangyl@dicp.ac.cn

Promotion Effects of CeO2 and Pd on Ni/γ-Al2O3 Catalyst

Yang Yong-Lai;Xu Heng-Yong;Li Wen-Zhao   

  1. Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023
  • Received:2001-09-16 Revised:2001-12-03 Published:2002-04-15
  • Contact: Yang Yong-Lai E-mail:yangyl@dicp.ac.cn

摘要: 采用脉冲微反技术研究了添加n型半导体氧化物CeO2及贵金属Pd对Ni/γAl2O3催化剂上CH4积炭/CO2消炭反应性能的影响,并运用BET、TPR、CO2TPSR及氢吸附等技术对催化剂进行了表征.结果表明, n型半导体氧化物CeO2的添加可以降低Ni/γAl2O3催化剂上CH4裂解积炭活性,提高CO2消炭活性,添加少量贵金属Pd可以进一步改变载体Al2O3、助剂CeO2和活性组分Ni之间的相互作用,从而改善Ni/γAl2O3催化剂的抗积炭性能.通过NiCePd/γAl2O3催化剂上CH4积炭/CO2消炭模型对上述作用机制作出了新的解释.

关键词: Ni/γ-Al2O3催化剂, CeO2, 贵金属Pd, CH4积炭, CO2消炭

Abstract: The influence of the addition of ntype semiconductor oxide CeO2 and noble metal Pd to Ni/γAl2O3 catalyst on carbon deposition by CH4 and carbon elimination by CO2 was studied by using a pulse microreaction as well as BET, TPR, CO2TPSR and hydrogen chemisorption techniques. It was found that, the addition of ntype semiconductor CeO2 to Ni/γAl2O3 catalyst could decrease carbon deposition activity of CH4 and increase carbon elimination ability of CO2; the addition of noble metal Pd could further alter the interaction between support Al2O3, promoter CeO2 and active phase Ni, as a result, the performance of resistance to carbon deposition of Ni/γAl2O3 catalyst was improved. At the same time, a new explanation for the above promoting effect was put forward by the models of carbon deposition by CH4 and carbon elimination by CO2 on the NiCePd/γAl2O3 catalyst.

Key words: Ni/γ-Al2O3 catalyst, CeO2, Noble metal Pd, Carbon deposition by CH4, Carbon elimination by CO2