物理化学学报 >> 2001, Vol. 17 >> Issue (11): 986-990.doi: 10.3866/PKU.WHXB20011106

研究论文 上一篇    下一篇

低能氮离子诱发丙酮与重水溶液的反应机理

石怀彬;邵春林;余增亮   

  1. 中国科学院等离子体物理研究所,合肥 230031
  • 收稿日期:2001-04-19 修回日期:2001-07-04 发布日期:2001-11-15
  • 通讯作者: 石怀彬 E-mail:shihuaibin@sina.com

Mechanism of the Reaction between Low Energy N and CH3COCH3 with D2O as Solvent

Shi Huai-Bin;Shao Chun-Lin;Yu Zeng-Liang   

  1. Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031
  • Received:2001-04-19 Revised:2001-07-04 Published:2001-11-15
  • Contact: Shi Huai-Bin E-mail:shihuaibin@sina.com

摘要: 利用氮气火花放电产生离子,其中的正离子在阴极位降的加速下“注入”到丙酮的重水溶液中,诱发其中的化学反应.利用气相色谱质谱(GCMS)分析离子注入后的样品,证实有氘代产物(CH3COCH2D)、氘羟基取代产物(CH3COCH2OD)生成,这表明低能N+诱发重水溶液中的反应主要是由于重水分子分解产生的自由基引起的,其中氘自由基和氘羟基自由基起重要作用;同时,产物中还检测到氘代乙酸(CH3COOD)和氘氨基丙酮(CH3COCH2ND2),说明反应是在氧化性氛围中进行的,氮离子俘获重水中的氘形成氘氨基可能是氘氨基取代产物生成的主要原因,也是氮“沉积”在溶液中的重要形式.这些结果对初步揭示低能离子诱发水溶液的反应机理具有一定的意义.

关键词: 离子注入, 丙酮, 重水溶液, 反应机理, 气相色谱-质谱

Abstract: Low energy ions were produced by N2 glowdischarge. The positive ones were accelerated into acetone solution with D2O as solvent to induce chemical reactions. GCMS analysis showed that CH3COCH2D, CH3COCH2OD were produced by such kind of implantation.Thus, it was proved that the reaction was mainly caused by radicals generated by decomposition of water molecules, and played an important role in the process. Meanwhile, CH3COOD and CH3COCH2ND2 were also found in the products, so it was concluded that the reaction was carried out under an oxidative atmosphere. The capture of D from D2O by N+ to form radicals was not only an initial step to produce CH3COCH2ND2 but also served as a probable pattern for “nitrogen deposition”. All these were helpful to reveal the mechanism of the reaction induced by low energy N+ implanting into solution samples.

Key words: Ion implantation, Acetone, D2O solution, Mechanism, GC-MS