物理化学学报 >> 1994, Vol. 10 >> Issue (05): 472-475.doi: 10.3866/PKU.WHXB19940520

研究简报 上一篇    下一篇

铜在低电导溶液中扩散机理的研究

冯益其, 周国定   

  1. 上海电力学院动力系,上海 200090
  • 收稿日期:1992-11-14 修回日期:1993-04-12 发布日期:1994-05-15
  • 通讯作者: 冯益其

Study on Diffusion Mechanism for Copper in Low-conductivity Solution

Feng Yi-Qi, Zhou Guo-Ding   

  1. Shanghai Institute of Electric Power, Shanghai 200090
  • Received:1992-11-14 Revised:1993-04-12 Published:1994-05-15
  • Contact: Feng Yi-Qi

关键词: 铜电极, 低电导溶液, Warburg阻抗, Warburg系数, 扩散

Abstract:

The cause of Warburg impedance on the impedance spectra for copper electrode in low-conductivity solution has been studied. The slopes of Randles plots (Warburg coefficients) do not change with dissolved oxygen concentration and strring rate, but they increase with the increase of the pH of solution and driesion time. The experimental results show that the Warburg twedance at low frequencies is caused by the diffusion of copper ions from the inner side to the outer side of the oxide film on the surface of copper electrode.

Key words: Copper electrode, Low-conductivity solution, Warburg impedance, Warburg coefficient, Diffusion