物理化学学报 >> 2003, Vol. 19 >> Issue (10): 892-895.doi: 10.3866/PKU.WHXB20031002

研究论文 上一篇    下一篇

超晶格多层膜的电化学制备、表征及其GMR特性的研究

姚素薇;赵瑾;王宏智;董大为   

  1. 天津大学化工学院,天津 300072
  • 收稿日期:2003-03-11 修回日期:2003-04-28 发布日期:2003-10-15
  • 通讯作者: 姚素薇 E-mail:yousuwei@263.net

Electrochemical Deposition, Characterization and the Study of Giant Magnetoresistance of Cu/Co Superlattice Multilayer

Yao Su-Wei;Zhao Jin;Wang Hong-Zhi;Dong Da-Wei   

  1. School of Chemical Engineering and Technology, Tianjin University, Tianjin 300072
  • Received:2003-03-11 Revised:2003-04-28 Published:2003-10-15
  • Contact: Yao Su-Wei E-mail:yousuwei@263.net

摘要: 以半导体Si为衬底,电化学沉积Cu/Co超晶格多层膜,用SEM表征多层膜的断面形貌.XRD研究表明,多层膜的调制波长为20~160 nm时,膜层间发生外延生长.随着调制波长的减小,外延生长对膜层结构的影响越来越明显.当调制波长小于20 nm时,在XRD强衍射峰的两侧出现卫星峰,表明多层膜形成超晶格结构.根据卫星峰位置计算的调制波长与由法拉第定律估算的结果非常接近.多层膜的巨磁电阻(GMR)性能随多层膜周期数的增加而增大;当周期数大于300时,GMR性能基本上不再随周期数变化,说明基体的导电性质对GMR的影响可以忽略.

关键词: 电沉积, 超晶格, 多层膜, 巨磁电阻(GMR), 结构

Abstract: Cu/Co superlattice multilayer were prepared on the p-type Si substrate by electrochemical deposition. The cross-section profile of the multilayer was examined by SEM.XRD analysis indicates that the multilayers grow epitaxially when the modulate wavelength (λ) ranges 20 nm to 160 nm. Further decrease of λ, the epitaxial growth becomes more prominent. When λ is smaller than 20 nm, satellite peaks in the XRD patterns indicate that the multilayer has formed a superlattice structure. In addition, the GMR performance of the multilayers increases with the increase of the number of periods and keeps steady when the number of periods is above 300,that is to say, its effect on GMR performance can be ignored.

Key words: Electrodeposition, Superlattice, Multilayer, Giant magnetoresistance (GMR), Structure