物理化学学报 >> 1996, Vol. 12 >> Issue (08): 673-676.doi: 10.3866/PKU.WHXB19960801

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266nm脉冲激光光解基质隔离的cis-(NO)2

王雪峰,余敏,秦启宗   

  1. 复旦大学激光化学研究所，上海 200433
  • 收稿日期:1996-05-13 修回日期:1996-06-17 发布日期:1996-08-15
  • 通讯作者: 秦启宗

266nm Pulsed Laser Photolysis of cis-(NO)2 in Cryogenic Solid Matrix

Wang Xue-Feng,Yu Min,Qin Qi-Zong   

  1. Institute of Laser Chemistry,Fudan University,Shanghai 200433
  • Received:1996-05-13 Revised:1996-06-17 Published:1996-08-15
  • Contact: Qin Qi-Zong

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关键词: 基质隔离, 激光光解, cis-(NO)2

Abstract:

The photodissociation of cis-(NO)2 in N2 and Ar matrices under 266 nm pulsed laser irradiation is reported. Results show the electronically excited O(1D) atom may be formed in the primary photolysis step. In the N2 matrix, the highly active O(1D) atoms could either react with N2 lattice molecules forming N2O or recombine with nearby N2O forming cis-(NO)2 and trans-(NO)2. However, in the Ar matrix the nascent state O(1D) atom, due to the lack of reactant, quenches to O(3P) as moving through the lattice site and the yield of N2O is less than that in N2 matrix.

Key words: Matrix isolation, Laser photodissociation, cis-(NO)2