物理化学学报 >> 1996, Vol. 12 >> Issue (05): 436-439.doi: 10.3866/PKU.WHXB19960510

研究简报 上一篇    下一篇

ρ-Si上电沉积制备镍-磷非晶薄膜催化剂

郭永,张国庆,姚素薇,郭鹤桐,龚正烈   

  1. 天津大学应用化学系,天津 300072|天津理工学院物理系,天津 300191
  • 收稿日期:1995-07-19 修回日期:1995-11-10 发布日期:1996-05-15
  • 通讯作者: 张国庆

Preparation of Nickel Phosphorous Amorphous Film Catalyst by Electrodeposition on ρ-type Silicon

Guo Yong,Zhang Guo-Qing,Yao Su-Wei,Guo He-Tong,Gong Zheng-Lie   

  1. Department of Applied Chemistry,Tianjin University,Tianjin 300072|Department of Physics,Tianjin Institute of Technology,Tianjin 300191
  • Received:1995-07-19 Revised:1995-11-10 Published:1996-05-15
  • Contact: Zhang Guo-Qing

关键词: ρ-Si, 非晶, Ni-P, 催化剂, 电沉积

Abstract:

Nickel phosphorous amorphous film catalyst was prepared by means of electrodeposition on p-type silicon. Effects of H3PO3 content in bath and current density on phosphorous content in the film were studied. With the increase of H3PO3 concentration and the decrease of current density, P content was increased remarkably, X-ray diffraction (XRD) showed that the film containning x (molar fraction)=0.109 P is amorphous. Scanning electronic microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) were used to investigate the morphology of the film and the chemical state of Ni, P, O on the surface.

Key words: ρ-Si, Amorphous, Ni-P, Catalyst, Electrodeposition