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物理化学学报  2017, Vol. 33 Issue (8): 1510-1511    DOI: 10.3866/PKU.WHXB201705171
亮点     
强界面相互作用h-BN/Re(0001)体系上不可修复的畴区拼接缺陷及其电子态
吴凯
北京大学化学与分子工程学院, 北京 100871
Irreparable Defects Produced by the Patching of h-BN Frontiers on Strongly Interacting Re(0001) and Their Electronic Properties
WU Kai
College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, P. R. China
 全文: PDF(670 KB)   输出: BibTeX | EndNote (RIS) |
出版日期: 2017-05-17
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引用本文:

吴凯. 强界面相互作用h-BN/Re(0001)体系上不可修复的畴区拼接缺陷及其电子态[J]. 物理化学学报, 2017, 33(8): 1510-1511.

WU Kai. Irreparable Defects Produced by the Patching of h-BN Frontiers on Strongly Interacting Re(0001) and Their Electronic Properties. Acta Phys. -Chim. Sin., 2017, 33(8): 1510-1511.

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http://www.whxb.pku.edu.cn/Jwk_wk/wlhx/CN/10.3866/PKU.WHXB201705171        http://www.whxb.pku.edu.cn/Jwk_wk/wlhx/CN/Y2017/V33/I8/1510

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