磁控溅射中靶-基底距离与Si共掺对ZnO:Al薄膜性质的影响
徐浩, 陆昉, 傅正文
Effects of Substrate-Target Distance and Si Co-Doping on the Properties of Al-Doped ZnO Films Deposited by Magnetron Sputtering
XU Hao, LU Fang, FU Zheng-Wen
物理化学学报 . 2011, (05): 1232 -1238 .  DOI: 10.3866/PKU.WHXB20110422