总气压与Ar/O2流量比对直流对向靶磁控溅射TiO2薄膜光催化性能的影响
陈芃, 谭欣, 于涛
Effects of Total Pressure and Ar/O2 Flow Ratios on Photocatalytic Properties of TiO2 Thin Films Deposited by Direct Current Facing-Target Magnetron Sputtering
CHEN Peng, TAN Xin, YU Tao
物理化学学报 . 2012, (09): 2162 -2168 .  DOI: 10.3866/PKU.WHXB201207061