光诱导约束刻蚀体系中羟基自由基生成的影响因素
胡艳, 方秋艳, 周剑章, 詹东平, 时康, 田中群, 田昭武
Factors Influencing Hydroxyl Radical Formation in a Photo-Induced Confined Etching System
HU Yan, FANG Qiu-Yan, ZHOU Jian-Zhang, ZHAN Dong-Ping, SHI Kang, TIAN Zhong-Qun, TIAN Zhao-Wu
物理化学学报 . 2013, (11): 2392 -2398 .  DOI: 10.3866/PKU.WHXB201309043