Acta Phys. -Chim. Sin. ›› 1998, Vol. 14 ›› Issue (01): 27-32.doi: 10.3866/PKU.WHXB19980106

• ARTICLE • Previous Articles     Next Articles

Influences of In3+ and Ga3+ on the Electrochemical Behaviour of Al in KOH Solution

Xu Gang, Cao Chu-Nan, Lin Hai-Chao, Zhang Jian-Qing   

  1. State Key Laboratory for Corrosion Protection,Institute of Corrosion Protection of Metals,Academia Sinica,Shenyang 110015|Department of Chemistry,Zhejiang University,Hangzhou 310027
  • Received:1997-04-14 Revised:1997-06-09 Published:1998-01-15
  • Contact: Xu Gang

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Abstract:

 Electrochemical Behaviors of Al in 1 mol•L-1 KOH solution without and with the addition of In3+or Ga3+ were investigated with potentiodynamic polarization and EIS techniques. Corrosion rates were measured by volumes of hydrogen evolved. The results show that though indium and gallium are the metals with high H2-evolution voltage, addition of In3+retards both anodic and cathodic reaction of the corrosion of Al in KOH solution and thus inhibits the corrosion, while Ga3+ accelerates the anodic dissolution process as well as the corrosion of Al in the solution. SEM verified the above results.

Key words: Potentiodynamic polarization, EIS, High H2-evolution voltage, In3+, Ga3+, Al dessolution, SEM