Acta Phys. -Chim. Sin. ›› 2000, Vol. 16 ›› Issue (10): 892-898.doi: 10.3866/PKU.WHXB20001006

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Simulation Analysis of Active Particles in Plasma Polymerization Film Deposition

Zhang Yu, Jin Xin-Yu, Chen Kang-Sheng   

  1. Department of Information and Electronic Engineering,Hangzhou 310027
  • Received:2000-01-13 Revised:2000-04-17 Published:2000-10-15
  • Contact: Jin Xin-Yu E-mail:jinxy@isee.zju.edu.cn

Abstract:

The active particles movements in hydrogen, oxygen and nitrogen DC glow discharge plasma have been simulated and analyzed by applying the electromagnetic theories and Monte Carlo simulation techniques. The energy and spatial density distribution graphs have been obtained. By comparison with the active energy range of ions, the results showed that in hydrogen and oxygen plasma there are sufficient active ions to participate in the physical and chemical reactions with the monomer molecules, which resulted in high deposition speed; in nitrogen plasma there are very few ions with sufficient active energy, which resulted in low deposition speed.

Key words: Particle enery, Monte Carlo simulation, Hydrogen, Oxygen, Nitrogen, Plasma polymerization