Acta Phys. -Chim. Sin. ›› 2001, Vol. 17 ›› Issue (03): 206-209.doi: 10.3866/PKU.WHXB20010304

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Electrodeposition of Ho-Ni Alloy from Dimethyformamide Bath

Wang Yu;Liu Guan-Kun;He Feng-Rong;Tong Ye-Xiang   

  1. Faculty of Chemistry and Chemical Engineering, Zhongshan University, Guangzhou  510275, China
  • Received:2000-07-19 Revised:2000-10-21 Published:2001-03-15
  • Contact: Liu Guan-Kun

Abstract: Cyclic voltammetry was used to study the electroreduction of Ho(III) i n Ho(NO3)3LiClO4DMF. The results showed that traces of water in this system blocked the electroreduct ion of Ho(III) by forming LiOH and Ho(OH)3 films on the electrode surface. Cod eposition of Ho and Ni was studied in dimethylformamide by cyclic voltammetry an d potentiostatic deposition at room temperature. Potentiostatic deposition was u sed to prepare HoNi alloys. EDAX, SEM and XRD were used to analyze the films. The results indicated that black, adhesive and amorphous HoNi alloy films on C u were produced where the content of Ho could be as high as 72.7 %.

Key words: Rare earths, Potentiostatic deposition, Dimethylformamide, Ho-Ni alloy