Acta Phys. -Chim. Sin. ›› 2001, Vol. 17 ›› Issue (11): 986-990.doi: 10.3866/PKU.WHXB20011106

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Mechanism of the Reaction between Low Energy N and CH3COCH3 with D2O as Solvent

Shi Huai-Bin;Shao Chun-Lin;Yu Zeng-Liang   

  1. Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031
  • Received:2001-04-19 Revised:2001-07-04 Published:2001-11-15
  • Contact: Shi Huai-Bin

Abstract: Low energy ions were produced by N2 glowdischarge. The positive ones were accelerated into acetone solution with D2O as solvent to induce chemical reactions. GCMS analysis showed that CH3COCH2D, CH3COCH2OD were produced by such kind of implantation.Thus, it was proved that the reaction was mainly caused by radicals generated by decomposition of water molecules, and played an important role in the process. Meanwhile, CH3COOD and CH3COCH2ND2 were also found in the products, so it was concluded that the reaction was carried out under an oxidative atmosphere. The capture of D from D2O by N+ to form radicals was not only an initial step to produce CH3COCH2ND2 but also served as a probable pattern for “nitrogen deposition”. All these were helpful to reveal the mechanism of the reaction induced by low energy N+ implanting into solution samples.

Key words: Ion implantation, Acetone, D2O solution, Mechanism, GC-MS