Abstract:

A Zn-Al-Ti material chip was fabricated by combinatorial technology using an ion beam sputtering method. The anti-corrosion properties of the Zn-Al alloy film and Ti doping effects on its corrosion resistance were investigated. High quality alloy films were obtained using low-temperature diffusion at 200 ℃ for 1 h combined with high-temperature crystallization at 370 ℃ for 2 h in Ar+5% (φ, volume fraction) H2 atmosphere. X-ray diffraction (XRD) and scanning electron microscope (SEM) were also used to characterize the structure and surface morphology of typical samples. The anti-corrosion behavior of samples was studied by electrochemical methods. Results indicated that the corrosion rate decreased markedly when a small amount of Ti was doped in the Zn-Al binary compositions. The Zn-Al-Ti alloy film doped with 6.0% (w, mass fraction) Ti (94.0% (w) Zn-Al with wAl:wZn=55%:45%) showed the best anti-corrosion behavior mainly because the small amount of Ti dopant developed fine grains, made the surface denser, and enhanced its passivation behavior.

Key words: Titanium doping, Zn-Al alloy film, Anti-corrosion, Combinatorial method