Acta Phys. -Chim. Sin. ›› 2013, Vol. 29 ›› Issue (03): 625-630.doi: 10.3866/PKU.WHXB201212271

• PHOTOCHEMISTRY AND RADIATION CHEMISTRY • Previous Articles     Next Articles

Diagnosis of Emission Spectra on Chemical Vapor Deposition of TiO2 System with Atmospheric-Pressure Radio Frequency Plasma

CHANG Da-Lei, LI Xiao-Song, ZHAO Tian-Liang, ZHU Ai-Min   

  1. Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, Liaoning Province, P. R. China
  • Received:2012-10-16 Revised:2012-12-26 Published:2013-02-25
  • Supported by:

    The project was supported by the National Natural Science Foundation of China (10835004, 51077009).

Abstract:

Diagnosis of emission spectroscopy on chemical vapor deposition (PCVD) of TiO2 with atmospheric-pressure radio frequency (RF) plasma was studied. The dependences of relative intensity of atomic oxygen line, Ar excitation temperature, OH rotational and vibrational temperatures were investigated on partial pressures of O2 and titanium tetraisopropoxide (TTIP) and input power, respectively. The relative intensity of the atomic oxygen line rapidly increased to a maximum and slowly decreased with increasing O2 partial pressure. OH vibrational temperature gradually increased, whereas Ar excitation temperature and OH rotational temperature showed little change. The relative intensity of the atomic oxygen line decreased, Ar excitation temperature remained constant, and OH vibrational and rotational temperatures increased with increasing TTIP partial pressure. The relative intensity of atomic oxygen line decreased, whereas the Ar excitation temperature and OH vibrational and rotational temperatures increased with increasing input power.

Key words: Atmospheric-pressure radio frequency plasma, Dielectric barrier discharge, Plasma chemical vapour deposition, Diagnosis of optical emission spectrum, TiO2

MSC2000: 

  • O644