欠电位沉积研究现状——II.欠电位沉积的研究方法及其应用

doi:10.3866/PKU.WHXB201505151

Abstract

Abstract:

A variety of primary in situ research techniques applied to underpotential deposition (upd) research, including electrochemical (cyclic voltammetry (CV), chronoamperometry (CHR), and electrochemical impedance spectroscopy (EIS)), interfacial (electrochemical quartz crystal microbalance (EQCM) and electrochemical scanning tunneling microscopy/electrochemical atomic force microscopy (ECSTM/ECAFM)) and X-ray based (X-ray absorption spectroscopy (XAS) and surface X-ray scattering (SXS)) analysis techniques, are summarized in this paper. We summarize and discuss the upd characteristics of many electrochemical systems as determined by these research techniques, and analyze the corresponding relationships and principles between the upd microscopic characteristics and macroscopic test results. Some conclusions of vital importance to upd drawn based on these techniques are explicitly discussed. Also, the merits and demerits of the above-mentioned research techniques are presented and compared. In the matter of application research areas of upd, four main aspects are summarized and analyzed: function materials' electrosynthesis, electroanalysis, electrochemical atomic layer epitaxy (ECALE), and electrochemically active surface area (ECSA) characterization of noble metal (or nano) materials. Meanwhile, the principles involved in the aforementioned applications research related to upd process are briefly explained. Finally, with respect to both research techniques and application research, this paper reveals the current status of upd research and gives a bird's eye view of development trends.

Key words: Underpotential deposition, Research technique, Electrosynthesis, Electroanalysis, Electrochemical atomic layer epitaxy, Electrochemically active surface area

MSC2000:

O646

XU Zhen, QI Dong-Mei, JIANG Li, CHEN Yu, ZHANG Zhao, ZHANG Jian-Qing. Progress of Research on Underpotential Deposition——II. Research Techniques and Application of Underpotential Deposition[J].Acta Phys. -Chim. Sin., 2015, 31(7): 1231-1250.

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