Acta Phys. -Chim. Sin. ›› 2017, Vol. 33 ›› Issue (2): 419-425.doi: 10.3866/PKU.WHXB201610192

• ARTICLE • Previous Articles     Next Articles

Molecular Beam Epitaxy Growth and Surface Structural Characteristics of PbTe(111) Thin Film

Hai-Fei WU1,*(),Yao CHEN1,Shan-Hu XU1,Yong-Hong YAN1,Jian-Xiao SI2,Yong-Sheng TAN1   

  1. 1 Department of Physics, Shaoxing University, Shaoxing 312000, Zhejiang Province, P. R. China
    2 College of Mathematics, Physics and Information Engineering, Zhejiang Normal University, Jinhua 312004, Zhejiang Province, P. R. China
  • Received:2016-08-09 Published:2017-01-12
  • Contact: Hai-Fei WU E-mail:wuhaifei@usx.edu.cn
  • Supported by:
    the National Natural Science Foundation of China(51202149,51302248,11575116,61405118)

Abstract:

PbTe thin films were epitaxially grown on BaF2(111) substrate using molecular beam epitaxy (MBE). In situ characterization by reflection high energy electron diffraction (RHEED) revealed a transition of the growth mode from 3D to 2D. Rotational symmetry studies combined with first principles density functional theory (DFT) calculations revealed that under Pb-rich and 350℃ substrate temperature (Tsub) growth conditions, stable (2×1) reconstructions appear on the PbTe(111) surface. When the surface of PbTe(111)-(2×1) was covered with Te, the stable (2×1) reconstructions could be retrieved under 300℃ annealing. This provides an effective method for the protection of PbTe film surfaces from the atmospheric environment.

Key words: Surface reconstruction, DFT, RHEED, Rotational symmetry, PbTe thin film

MSC2000: 

  • O647