Acta Phys. -Chim. Sin. ›› 2016, Vol. 32 ›› Issue (12): 2841-2870.doi: 10.3866/PKU.WHXB201611021

• REVIEW • Previous Articles     Next Articles

Recent Advances in Morphology Control and Surface Modification of Bi-Based Photocatalysts

Rong-An HE1,2,Shao-Wen CAO1,Jia-Guo YU1,*()   

  1. 1 State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, P. R. China
    2 Hunan Province Key Laboratory of Applied Environmental Photocatalysis, Changsha University, Changsha 410022, P. R. China
  • Received:2016-09-16 Published:2016-11-30
  • Contact: Jia-Guo YU E-mail:jiaguoyu@yahoo.com
  • Supported by:
    the National Key Basic Research Program of China (973)(2013CB632402);the National Natural ScienceFoundation of China(51272199,51320105001,51372190,21433007,21407115)

Abstract:

Bi-based semiconductor photocatalysts are important visible-light-driven photocatalysts. However, the photocatalytic performance of bulk bismuth-containing compounds remains unsatisfactory. Many investigations indicate that morphology control and surface modification are effective methods for improving the photocatalytic activity of these compounds. Herein, we review recent advances in this field, including ultrathin nanoplate fabrication, facet ratio control, hierarchical and hollow architecture construction, functional group and quantum-sized nanoparticle modification, surface defect regulation, and in situ formation of metal bismuth and bismuth compounds. The characteristics and advantages of these modification methods are introduced. In addition, mechanisms for improving light absorption, separation, and utilization of excited carriers are discussed. Trends in the development of Bi-based photocatalysts using morphology control and surface modification, as well as the challenges involved, are also analyzed and summarized.

Key words: Bi-based compound, Photocatalysis, Morphology control, Surface modification

MSC2000: 

  • O643