Acta Phys. -Chim. Sin. ›› 1998, Vol. 14 ›› Issue (05): 429-434.doi: 10.3866/PKU.WHXB19980509

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Study on the Reaction Rate and Mechanism of Ni-P Electroless Plating

Zhang Guo-Dong   

  1. Department of Chemical Engineering,East China Institute of Metallurgy,Ma'anshan 243002
  • Received:1997-08-27 Revised:1997-12-17 Published:1998-05-15
  • Contact: Zhang Guo-Dong

Abstract:

The deposition rate of Ni-P electroless coating and the decomposition rate of H2PO, were studied by analyzing the mass and the P content of the electeroless coating, and by measuring the volume of the evolved hydrogen. Based on the mixed potential theory, electroless plating current, which can be expressed by the reaction rate, was obtained by analyzing the polarzation curves of Ni-P in solutions of various composition. The reaction is consistant with the one electron transfer mechanism. The influnce of the solution pH on electeoless plating rate and electroless plating effeciency was explained.

Key words: Ni-P electroless plating, Mixed porential theory, Reaction mechanism