Acta Phys. -Chim. Sin. ›› 2004, Vol. 20 ›› Issue (10): 1191-1195.doi: 10.3866/PKU.WHXB20041005

• ARTICLE • Previous Articles     Next Articles

Photoelectrochemical Characteristics of Nano-Titanium Dioxide Thin Films Prepared by RF Magnetron Sputtering

Shen Jie;Wo Song-Tao;Cui Xiao-Li;Cai Zhen-Wei;Yang Xi-Liang;Zhang Zhuang-Jian   

  1. Department of Materials Science, Fudan University, Shanghai 200433
  • Received:2004-03-29 Revised:2004-05-12 Published:2004-10-15
  • Contact: Zhang Zhuang-Jian

Abstract: Nanoscale titanium dioxide thin films were prepared at room temperature by RF magnetron sputtering process and annealed at different temperatures. Electrochemical characteristic of ITO/TiO2 electrode under UV irradiation was investigated using the method of cyclic voltammetry, and photo-induced hydrophilicity and photocatalytic activity of TiO2 thin films have been studied. It shows that the as deposited TiO2 thin films are in amorphous state and the anatase phase forms when anneal temperature is over 400 ℃. New oxidative peaks were observed when the TiO2 electrode was irradiated by 254 nm UV light for a certain time. The peak current increased with the increase of UV irradiation time. The oxidative peaks at 0.1 V and 0.05 V were observed for TiO2 electrode annealed at 300 and 500 ℃,respectively, and both were observed for TiO2 electrode annealed at 400 ℃. It is assumed that the new oxidative peak belongs to the oxidation of Ti3+, which was formed during the UV illumination, and the changes of hydrophilicity of the films may be related with the formation of Ti3+ on the surface when the films were irradiated by UV light. The TiO2 thin films annealed at 400 ℃ exhibit a good hydrophilicity and photocatalytic activity.

Key words: RF(radio frequency) magnetron sputtering, Titanium dioxide thin films