Acta Phys. -Chim. Sin. ›› 2011, Vol. 27 ›› Issue (09): 2233-2238.doi: 10.3866/PKU.WHXB20110820

• PHYSICAL CHEMISTRY OF MATERIALS • Previous Articles     Next Articles

Super-Hydrophobic Silicon/Silica Hierarchical Structure Film

WANG Jian-Tao1,2, ZHANG Xiao-Hong1, WANG Hui1, OU Xue-Mei1   

  1. 1. Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, P. R. China;
    2. Graduate University of Chinese Academy of Sciences, Beijing 100049, P. R. China
  • Received:2011-04-20 Revised:2011-06-08 Published:2011-08-26
  • Contact: ZHANG Xiao-Hong E-mail:xhzhang@mail.ipc.ac.cn
  • Supported by:

    The project was supported by the National Natural Science Foundation of China (50825304, 50972150, 20971128).

Abstract: Silicon (Si)-based materials with a super-hydrophobic surface were prepared using microscale rough surfaces, which were subsequently modified by organic compounds with low surface energies. However, the super-hydrophobicity was gradually lost because of the degradation of the organic compounds when applied to an outer environment. Herein, a Si-based film with a super-hydrophobic surface fabricated by chemical vapor deposition (CVD) using a liquid metal (tin) as the growth substrate is reported. We found that the film was composed of vertical Si/SiO2 hierarchical wires upon characterization by scanning electron microscopy (SEM), transmission electron microscopy (TEM), and X-ray diffraction (XRD). Reasons for the generation of this super-hydrophobicity are given using the Cassie model. We conclude that the special Si/SiO2 hierarchical structure plays an important role in the super-hydrophobic performance of the film. Compared with the previous Si-based material with a super-hydrophobic surface, this novel structure promises to widen its area of application since its super-hydrophobicity is independent of chemical modification.

Key words: Super-hydrophobic, Core-shell structure, Silicon nanowire, Chemical vapor deposition, Film

MSC2000: 

  • O647