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Acta Physico-Chimica Sinica  2007, Vol. 23 Issue (09): 1347-1352    DOI: 10.3866/PKU.WHXB20070908
Article     
Influence of Interface Diffusion between Al Substrate and TiO2 Filmon Photocatalytic Activity
ZHANG Wei; WANG Shu-Liang; MA Yun-Qing; WANG Cui-Ping; LIU Xing-Jun
Department of Materials Science and Engineering, Xiamen University, Xiamen 361005, Fujian Province, P. R. China
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Abstract  TiO2 nano-crystalline films on Al substrate were prepared from tetra-n-butyl titanate by sol-gel method. The synthesized TiO2 films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The photodegradation activity of methylene blue (MB) solutions under UV irradiation was studied. The results indicated that the TiO2 particles could be built up from crystallites ranging from 10 nm to 20 nm and had a dense bonding. The interface diffusion between TiO2 and Al substrate takes place at calcination temperature of 450 ℃ for 30 min and Al element diffuses into TiO2 film from Al substrate, forming a diffusion layer with a thickness of about 75 nm. The interface diffusion between TiO2 and Al substrate leaded to the inferior photocatalytic activity. The influence of Al substrate on photodegradation activity of MB solutions became less and less as the thickness of the thin filmincreased.

Key wordsPhotocatalysis      TiO2 film      Interface diffusion      Al substrate      Sol-gel method     
Received: 19 March 2007      Published: 22 July 2007
MSC2000:  O643  
Corresponding Authors: LIU Xing-Jun     E-mail: lxj@xmu.edu.cn
Cite this article:

ZHANG Wei; WANG Shu-Liang; MA Yun-Qing; WANG Cui-Ping; LIU Xing-Jun. Influence of Interface Diffusion between Al Substrate and TiO2 Filmon Photocatalytic Activity. Acta Physico-Chimica Sinica, 2007, 23(09): 1347-1352.

URL:

http://www.whxb.pku.edu.cn/Jwk_wk/wlhx/10.3866/PKU.WHXB20070908     OR     http://www.whxb.pku.edu.cn/Jwk_wk/wlhx/Y2007/V23/I09/1347

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