Acta Phys. -Chim. Sin. ›› 2007, Vol. 23 ›› Issue (09): 1425-1431.doi: 10.3866/PKU.WHXB20070922

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Chemical Kinetics of the Removal of Formaldehyde in Dielectric Barrier Discharges

ZHANG Jing; LU Fu-Gong; XU Yong; YANG Xue-Feng; ZHU Ai-Min   

  1. State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, Liaoning Province, P. R. China; Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, Liaoning Province, P. R. China
  • Received:2007-03-25 Revised:2007-04-27 Published:2007-09-06
  • Contact: ZHU Ai-Min

Abstract: A time and space averaged chemical kinetics model in the removal of formaldehyde via a dielectric barrier discharge at atmospheric pressure and ambient temperature was reported. An analysis with regard to the discharge time evolution of the different main species was also included, and the results of the analysis showed that O· and OH·radicals, especially OH·radicals, were the key species for the removal of HCHO. The role played by the first electronically excited metastable state N2(A3∑+u) was clarified that, in air, the chemical attacks of O2 and H2Oby N2(A3∑+u) produced much more O·and OH·radicals. In nitrogen, N2(A3∑removal of HCHO. Specific energy cost and the molar ratio of nCO2 /nCO for HCHOremoval at different HCHOinitial concentrations and gas flow rates were also discussed. Specific energy cost at high HCHO initial concentration was lower than that at low HCHOinitial concentration. If input discharge energy density <60 J·L-1, nCO2 /nCO at lowHCHOinitial concentration was higher than that at high HCHO initial concentration.

Key words: Dielectric barrier discharge, HCHO, Chemical kinetics, Modeling


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