Acta Phys. -Chim. Sin. ›› 1999, Vol. 15 ›› Issue (08): 684-687.doi: 10.3866/PKU.WHXB19990804

• Communication • Previous Articles     Next Articles

Study of MoO3 Surface Diffusion on the Al2O3 Film

Yan Jing-Feng, Wu Nian-Zu, Zhang Hong-Xia, Xie You-Chang, Tang You-Qi, Zhu Yong-Fa, Yao Wen-Qing   

  1. College of Chemistry and Moleculr Engineering,Peking University,Beijing 100871|Analysisis Center of Tsinghua University,Beijing 100084
  • Received:1999-04-20 Revised:1999-06-03 Published:1999-08-15
  • Contact: Wu Nian-Zu


A flat and compact Al2_O3 film of 20urn in thickness was prepared on the substrate of Si wafer by magnetic controlled sputtering Al reaction with O2 in Ar. A small amount of MoO3 was vaporized in vacuum and deposited onto a slot in a covering film on the surface of A12O3 film. The samples were heated in dry or wet N2, O2 and air respectively, characterized by TRSRF, AES, XPS, XRD and SEM to study the surface diffusion of MoO3 on the A12O3 film. The results show that MoO_3 can diffuse on the surface of Al_2O_3 film by heating the samples at 573K or 673K. The diffusion rate increases with the heating temperature. moisture can accelerate the diffusion rate of MoO_3 on the surface of Al_2O_3.

Key words: Oxide, Surface diffusion, AES, TRSRF