Acta Phys. -Chim. Sin. ›› 2006, Vol. 22 ›› Issue (06): 696-700.doi: 10.1016/S1872-1508(06)60029-6

• ARTICLE • Previous Articles     Next Articles

Two New Methods for Characterizing the Kinetics of the Complexation of Metal/Organic Thin Films and Oxidation of Metal Thin Films

ZHONG Cheng;JIANG Yi-Ming;LUO Yu-Feng;LIAO Jia-Xing;WU Wei-Wei;LI Jin   

  1. Department of Materials Science, Fudan University, Shanghai 200433, P. R. China
  • Received:2005-11-11 Revised:2006-02-16 Published:2006-05-31
  • Contact: LI Jin E-mail:jinli@fudan.edu.cn

Abstract: Two new methods were developed for characterizing the kinetics of the complexation and oxidation processes of the thin films by using transmission spectrum and sheet resistance. Ag/TCNQ (7, 7, 8, 8-tetracyanoquino-dimethane) bi-layer films and copper films were prepared on glass substrate by vacuum deposition. The complex kinetics of Ag/TCNQ bi-layer thin films was studied via the transmission spectrum. The oxidation kinetics of the copper thin films was studied via sheet resistance, which increased during the process. The results suggested that these two methods can be used to characterize the kinetics of the reaction process of thin films.

Key words: Thin film, Oxidation and complexation reaction, Kinetics characterization