Acta Phys. -Chim. Sin. ›› 1998, Vol. 14 ›› Issue (08): 715-718.doi: 10.3866/PKU.WHXB19980809

• ARTICLE • Previous Articles     Next Articles

Effects of Mass Energy Deposition of Low Energy lons lmplantation in Solid Sodium Formate

Wang Xiang-Qin, Yao Jian-Ming, Huang Wei-Dong, Yu Zeng-Liang   

  1. Institute of Plasmal Physics,Chinese Academy of Sciences,Hefei 230031
  • Received:1997-11-11 Revised:1998-01-26 Published:1998-08-15
  • Contact: Wang Xiang-Qin

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Abstract:

Solid HCOONa sample was implanted by ions such as N+、H+、Ar+、with the same energy. The induced damage was detected by EPR and infrared (IR) spectra. It showed that the-CH2- group and COO- radical ion could be produced in implanted HCOONa sample with N+、H+、Ar、ions. By using the analysis of the highly sensitive ninhydrin reaction. It was proved that NH2 group could be produced by N+ ion beam.

Key words: Ion implantation, HCOONa, Effects of mass energy deposition