Acta Phys. -Chim. Sin. ›› 2001, Vol. 17 ›› Issue (10): 868-872.doi: 10.3866/PKU.WHXB20011002

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Fabrication of Nanostructures on Si Surface Using Gold Nanoparticle Mask

Chen Zhu-Cheng;Zheng Ji-Wen;Liu Zhong-Fan   

  1. Center for Nanoscale Science & Technology (CNST) and College of Chemistry and Molecular Engineering,Peking University,Beijing 100871
  • Received:2001-03-01 Revised:2001-04-13 Published:2001-10-15
  • Contact: Liu Zhong-Fan

Abstract: Using gold nanoparticle as nanooxidation mask,tapping mode atomic force microscope (TMAFM) nanolithography and wet chemical etching techniques were combined to build nanostructure on Si surface. The nanoparticles were immobilized on mercaptopropyltrimethoxysilane (MPTS)modified silicon surface via Au-S bonding and were exploited as the lithography mask to prevent the AFM tipinduced nanooxidation of MPTS and silicon substrate. It was found that the nanostructures formed on Si surface were dependent on the tipsample separation. With a certain bias voltage,scanning rate and relative humidity,adjusting the separation to 7.5 nm,nanopillar structures were obtained;while decreasing the separation to 5 nm,nanoring structures appeared . To explain the formation mechanism of these nanostructures,a hard ball model based on nanoparticle physical shielding effect was proposed.

Key words: Atomic force microscope (AFM), Gold nanoparticle, Local nanooxidation