Acta Phys. -Chim. Sin. ›› 2001, Vol. 17 ›› Issue (10): 931-935.doi: 10.3866/PKU.WHXB20011013

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A New Method to Pattern Silicon Surface with Chemical Functional Groups

Wu Rui-Ge;Ouyang Jian-Hua;Zhao Xin-Sheng;Huang Xiao-Hua;Huang Hui-Zhong;Wu Nian-Zu   

  1. State Key Laboratory of Molecular Dynamic and Stable Structures, Institute of Physical Chemistry, Peking University, Beijing　100871
  • Received:2001-02-19 Revised:2001-04-30 Published:2001-10-15
  • Contact: Zhao Xin-Sheng E-mail:zhaoxs@chem.pku.edu.cn

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Abstract: Hydrogenterminated silicon surface was found to react with 1alkenes to produce stable monolayers. To pattern such monolayers and create surfaces with regions of different chemical functionalities, we used the combination of the photolithography and the light induced alkylation. The surfaces had been characterized by XPS, AFM, and contact angel measurement. It is shown that this procedure can be used to prepare micropatterns of chemical functional groups on silicon substrate.

Key words: Monolayers, Molecular architecture, Photolithograph, Pattern, Silicon surface