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Acta Physico-Chimica Sinica  2004, Vol. 20 Issue (10): 1191-1195    DOI: 10.3866/PKU.WHXB20041005
Article     
Photoelectrochemical Characteristics of Nano-Titanium Dioxide Thin Films Prepared by RF Magnetron Sputtering
Shen Jie;Wo Song-Tao;Cui Xiao-Li;Cai Zhen-Wei;Yang Xi-Liang;Zhang Zhuang-Jian
Department of Materials Science, Fudan University, Shanghai 200433
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Abstract  Nanoscale titanium dioxide thin films were prepared at room temperature by RF magnetron sputtering process and annealed at different temperatures. Electrochemical characteristic of ITO/TiO2 electrode under UV irradiation was investigated using the method of cyclic voltammetry, and photo-induced hydrophilicity and photocatalytic activity of TiO2 thin films have been studied. It shows that the as deposited TiO2 thin films are in amorphous state and the anatase phase forms when anneal temperature is over 400 ℃. New oxidative peaks were observed when the TiO2 electrode was irradiated by 254 nm UV light for a certain time. The peak current increased with the increase of UV irradiation time. The oxidative peaks at 0.1 V and 0.05 V were observed for TiO2 electrode annealed at 300 and 500 ℃,respectively, and both were observed for TiO2 electrode annealed at 400 ℃. It is assumed that the new oxidative peak belongs to the oxidation of Ti3+, which was formed during the UV illumination, and the changes of hydrophilicity of the films may be related with the formation of Ti3+ on the surface when the films were irradiated by UV light. The TiO2 thin films annealed at 400 ℃ exhibit a good hydrophilicity and photocatalytic activity.

Key wordsRF(radio frequency) magnetron sputtering      Titanium dioxide thin films     
Received: 29 March 2004      Published: 15 October 2004
Corresponding Authors: Zhang Zhuang-Jian     E-mail: shenjie@fudan.edu.cn
Cite this article:

Shen Jie;Wo Song-Tao;Cui Xiao-Li;Cai Zhen-Wei;Yang Xi-Liang;Zhang Zhuang-Jian. Photoelectrochemical Characteristics of Nano-Titanium Dioxide Thin Films Prepared by RF Magnetron Sputtering. Acta Physico-Chimica Sinica, 2004, 20(10): 1191-1195.

URL:

http://www.whxb.pku.edu.cn/Jwk_wk/wlhx/10.3866/PKU.WHXB20041005     OR     http://www.whxb.pku.edu.cn/Jwk_wk/wlhx/Y2004/V20/I10/1191

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