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Acta Physico-Chimica Sinica  1999, Vol. 15 Issue (08): 764-768    DOI: 10.3866/PKU.WHXB19990819
Note     
Quantitative Measurement of Adsorption of CH3OH on Commonly Used Mterials by Photoacoustic Method
Deng Guo-Yang, Jes Henningsen
Zhongnan Institute of Technology,Hengyang 421001|Danish Institute of Fundamental Metrology,Copenhagen,Denmark
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Abstract  

 A photoacoustic method to quantitatively measure the adsorption of CH_3OH on gas-solid interface is presented. The adsorption of CH_3OH on such commonly used materials as quartz, pyrex, polytetrafluoroethylene teflon, petheoroalcoxy teflon and polished stainless steel SS316 is measured. Kinetic simulation can explain the experimental results, thus providing a basis for the generalization of the experimental results. The adsorption property of the materials at reduced temperature is also studied.



Key wordsPhotoacoustic method      Adsorption      Methyl alcohol     
Received: 08 December 1998      Published: 15 August 1999
Corresponding Authors: Deng Guo-Yang   
Cite this article:

Deng Guo-Yang, Jes Henningsen. Quantitative Measurement of Adsorption of CH3OH on Commonly Used Mterials by Photoacoustic Method. Acta Physico-Chimica Sinica, 1999, 15(08): 764-768.

URL:

http://www.whxb.pku.edu.cn/10.3866/PKU.WHXB19990819     OR     http://www.whxb.pku.edu.cn/Y1999/V15/I08/764

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