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Acta Physico-Chimica Sinica  2005, Vol. 21 Issue (01): 69-73    DOI: 10.3866/PKU.WHXB20050114
Preparation of TiO2 Thin Films at Low Temperature and Characterization of Their Properties
BAO Xing-Wang;ZHANG Jin-Long;LIANG Xue-Hai;HUANG Jia-Zhen;ZHANG Li-Zhong
Laboratory for Advanced Materials and Institute of Fine Chemicals, Center of Analysis and Testing, East China University of Science and Technology, Shanghai 200237
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Abstract  TiO2 and TiO2-SiO2 thin films were prepared at low-temperature with hot water treatment. Their crystal structure, surface morphology and transparency were characterized by XRD, AFM and UV-Vis spectra respectively, and the effects of addition of SiO2 in the films on their performances after treatment with hot water were analyzed. The evaluations of photocatalytic activities of thin films were carried out by degradation of rhodamine B in water solution under UV irradiation. The results showed that the thin films prepared at low temperature with hot water treatment have high reactivity for degradation of rhodamine B and the addition of SiO2 can significantly increase the photocatalytic reactivitity.

Key wordsHot water treatment      TiO2 thin films      AFM      Low temperature       Photocatalysis     
Received: 28 June 2004      Published: 15 January 2005
Corresponding Authors: ZHANG Jin-Long     E-mail:
Cite this article:

BAO Xing-Wang;ZHANG Jin-Long;LIANG Xue-Hai;HUANG Jia-Zhen;ZHANG Li-Zhong. Preparation of TiO2 Thin Films at Low Temperature and Characterization of Their Properties. Acta Physico-Chimica Sinica, 2005, 21(01): 69-73.

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