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ISSN 1000-6818CN 11-1892/O6CODEN WHXUEU
Acta Phys Chim Sin >> 1996,Vol.12>> Issue(10)>> 939-942     doi: 10.3866/PKU.WHXB19961017         中文摘要
Effect of Chemical Vapour Deposition on Pt/KL Catalyst for the Aromatization of n-Hexane
Zheng Jian,Chun Yuan,Dong Jia-Lu,Xu Qin-Hua
Department of Chemsitry,Nanjing University,Nanjing 210093
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 Modification of KL zeolite by chemical vapour deposition (CVD) of Si(OEt)4 and (CH3)3SiOSi(CH3)3 was used to study the influence of zeoltie support on the aromatization of n-hexane over Pt/KL catalyst. The pore size and pore volume of zeolite were decreased by CVD. The acidic hydroxyl groups remaining on the surface of KL zeolite were removed and thus the selectivity of non-acidic catalyzed aromatization reaction was improved. Whereas the activity of aromatiztion reaction was decreased due to the destruction of some of active sites in KL zeolite for 1,6-cyclization. Becuase of the coverage of the framework of zeolite by CVD of SiO2, Pt particles became more electron-excess. Therefore, the silica-coated catalysts were easier to be poisoned by sulphur.



Keywords: Chemical vapour deposition   KL zeolite   Pt supported   Armoatization of n-hexane   Sulphur poisoning  
Received: 1995-11-20 Accepted: 1996-06-17 Publication Date (Web): 1996-10-15
Corresponding Authors: Xu Qin-Hua Email:


Cite this article: Zheng Jian,Chun Yuan,Dong Jia-Lu,Xu Qin-Hua. Effect of Chemical Vapour Deposition on Pt/KL Catalyst for the Aromatization of n-Hexane[J]. Acta Phys. -Chim. Sin., 1996,12 (10): 939-942.    doi: 10.3866/PKU.WHXB19961017
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