Acta Phys. -Chim. Sin. ›› 2009, Vol. 25 ›› Issue (09): 1763-1768.doi: 10.3866/PKU.WHXB20090827

• ARTICLE • Previous Articles     Next Articles

Combinatorial Optimization for the Anti-Corrosion Properties of Ti Doped Zn-Al Alloy Films

ZHANG Jing-Yu, LIU Qing-Feng, LIU Qian   

  1. State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, P. R. China|Graduate University of Chinese Academy of Sciences, Beijing 100049, P. R. China
  • Received:2009-04-10 Revised:2009-05-19 Published:2009-09-03
  • Contact: LIU Qian E-mail:qianliu@sunm.shcnc.ac.cn

Abstract:

A Zn-Al-Ti material chip was fabricated by combinatorial technology using an ion beam sputtering method. The anti-corrosion properties of the Zn-Al alloy film and Ti doping effects on its corrosion resistance were investigated. High quality alloy films were obtained using low-temperature diffusion at 200 ℃ for 1 h combined with high-temperature crystallization at 370 ℃ for 2 h in Ar+5% (φ, volume fraction) H2 atmosphere. X-ray diffraction (XRD) and scanning electron microscope (SEM) were also used to characterize the structure and surface morphology of typical samples. The anti-corrosion behavior of samples was studied by electrochemical methods. Results indicated that the corrosion rate decreased markedly when a small amount of Ti was doped in the Zn-Al binary compositions. The Zn-Al-Ti alloy film doped with 6.0% (w, mass fraction) Ti (94.0% (w) Zn-Al with wAl:wZn=55%:45%) showed the best anti-corrosion behavior mainly because the small amount of Ti dopant developed fine grains, made the surface denser, and enhanced its passivation behavior.

Key words: Titanium doping, Zn-Al alloy film, Anti-corrosion, Combinatorial method

MSC2000: 

  • O646